James G House

Title: Innovations of James G. House in Integrated Circuits

Introduction

James G. House is an accomplished inventor based in Kettering, Ohio. He has made significant contributions to the field of integrated circuits, particularly in the area of metal layer reworking. His innovative approach has led to advancements that enhance the reliability and efficiency of electronic devices.

Latest Patents

James G. House holds a patent for a method of reworking the upper metal in multilayer metal integrated circuits. This process involves reworking the upper level metal layer of an integrated circuit wafer that has multiple levels of metal connected by vias through intermediate dielectric layers. The method begins with the formation of a photoresist masking layer over the defective upper level metal. The wafer is then subjected to a metal etch to completely remove the exposed upper level metal while etching into the metal under the photoresist until the etching enters the metal in the via. After the etching process, the residual photoresist is removed. The rework process concludes with a single chamber operation that includes a sputter etch followed by the deposition of new upper level metal. This sequence ensures proper via metal surface conditioning for reliable deposition bonding of the new upper level metal.

Career Highlights

James G. House is associated with NCR Corporation, where he has applied his expertise in integrated circuits. His work has been instrumental in developing processes that improve the performance and reliability of electronic components.

Collaborations

James has collaborated with Thomas E. Cynkar, contributing to advancements in their field through shared knowledge and expertise.

Conclusion

James G. House's innovative methods in the reworking of integrated circuits demonstrate his commitment to enhancing technology in the electronics industry. His contributions continue to influence the development of reliable electronic devices.