Company Filing History:
Years Active: 1984-1998
Title: Innovations of James E. Oxley
Introduction
James E. Oxley is a notable inventor based in New Haven, CT (US). He has made significant contributions to the field of etching solutions, particularly in the regeneration of etchant solutions used in printed circuit board fabrication. With a total of 3 patents to his name, Oxley's work has had a considerable impact on the industry.
Latest Patents
One of his latest patents is titled "Apparatus and a process for regenerating a CUCl.sub.2 etchant." This invention relates to an apparatus and a process for regenerating a used etchant solution that contains a metal in divalent form. The apparatus includes a tank originally supplied with the etchant solution, a first electrolytic cell for converting the solution from the tank to a solution containing a high fraction of a monovalent form of the metal, and a second electrolytic tank for plating metal from the solution containing a high fraction of the monovalent form of the metal. The details of this process are thoroughly outlined in the patent disclosure.
Another significant patent is "Electrolytic regeneration of acid cupric chloride etchant." This invention describes an electrolytic apparatus and process for the on-line regeneration of acid cupric chloride etching baths used in printed circuit board fabrication. The apparatus utilizes a regeneration process that reverses the reaction Cu + CuCl.sub.2 → 2CuCl, ensuring that the copper metal etched into the system is completely removed while maintaining the concentration of cuprous and cupric chloride within the desired range. A preferred system employs a flow-through graphite or carbon anode and a flow-by cathode, allowing for precise control of current and potential variables. This cell operates at low voltage, resulting in less waste heat generation, lower electrical costs, and improved on-line process control.
Career Highlights
James E. Oxley has worked with several prominent companies throughout his career, including Olin Corporation and Oxley Research, Inc. His experience in these organizations has contributed to his expertise in the field of etching solutions and their regeneration processes.
Collaborations
Oxley has collaborated with notable individuals in his field, including Igor V. Kadija and Raymond J. Smialek. These collaborations have likely enriched his work and contributed to the advancements in etching technology.
Conclusion