Fishkill, NY, United States of America

Jagtar S Basi


Average Co-Inventor Count = 1.2

ph-index = 8

Forward Citations = 174(Granted Patents)


Location History:

  • Wappingers Falls, NY (US) (1976)
  • Fishkill, NY (US) (1976 - 1985)

Company Filing History:


Years Active: 1976-1985

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9 patents (USPTO):Explore Patents

Title: **The Innovative Journey of Jagtar S Basi**

Introduction

Jagtar S Basi is a notable inventor based in Fishkill, NY, known for his significant contributions to the field of semiconductor technology. With an impressive portfolio of nine patents, he has proven to be a vital asset in the realm of technological innovations.

Latest Patents

Among Jagtar’s latest patents is a method for polishing semiconductor wafers using montmorillonite slurry. This innovative technique involves dispersing montmorillonite clay in deionized water to create an abrasive slurry, with its pH adjusted to a precise range of 9.5 to 12.5 by incorporating alkali substances such as NaOH and KOH. Another patent highlights a method for polishing amorphous aluminum oxide, showcasing his expertise in refining materials that are critical for advanced technological applications.

Career Highlights

Jagtar currently works at the International Business Machines Corporation (IBM), a prestigious organization known for its pioneering work in information technology and computer systems. His role at IBM has enabled him to focus on advancing semiconductor processing techniques, contributing to the company’s legacy of innovation.

Collaborations

Throughout his career, Jagtar has collaborated with several talented individuals, including coworkers Eric Mendel and Eric Mandel. These collaborations have played a crucial role in enhancing the quality and efficacy of his inventions, demonstrating the value of teamwork in the field of technology development.

Conclusion

In summary, Jagtar S Basi's contributions to the realm of inventions, particularly in semiconductor processing, highlight his innovative spirit and commitment to advancing technology. His latest patents not only reflect his expertise but also his dedication to improving the efficiency of critical manufacturing processes.

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