Jagannathan Premlatha

Title: Innovations of Jagannathan Premlatha

Introduction

Jagannathan Premlatha is an accomplished inventor based in Patterson, NY (US). He has made significant contributions to the field of lithography through his innovative patent. His work primarily focuses on developing advanced materials that enhance the efficiency and effectiveness of imaging processes.

Latest Patents

Jagannathan holds a patent for a silicon-containing negative resist for DUV, I-line, or E-beam lithography. This innovative photoresist serves as the top imaging layer in a bilayer substrate patterning scheme. The photoresist is a single component resist, where the photoactive element is chemically bonded to the base polymer. Specifically, an aromatic azide containing group is covalently bonded to the phenolic group of poly(4-hydroxybenzyl)silsesquioxane (PHBS) via an esterification reaction. This new photoresist is easily synthesized and boasts advantageous properties such as aqueous base developability, excellent O.sub.2 RIE resistance, and high sensitivity to DUV, I-line, and E-beam exposures.

Career Highlights

Jagannathan Premlatha is associated with the International Business Machines Corporation (IBM), where he applies his expertise in materials science and engineering. His work at IBM has allowed him to contribute to cutting-edge technologies that are essential for modern lithography applications.

Collaborations

Jagannathan has collaborated with notable colleagues, including Harbans S Sachdev and Ratnam Sooriyakumaran. These collaborations have fostered a productive environment for innovation and have led to advancements in their respective fields.

Conclusion

Jagannathan Premlatha's contributions to the field of lithography through his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the industry and showcases the importance of research and development in creating effective solutions.