This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Semes Co., Ltd.. Active years: 2020-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020-2025
Title: Jae Hwan Cho: Innovator in Substrate Treatment Technology
Introduction
Jae Hwan Cho is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of advanced apparatuses that enhance the efficiency and effectiveness of substrate processing.
Latest Patents
Jae Hwan Cho holds a patent for a substrate treating apparatus and inspection method. This patent includes a process chamber with a treatment space, a support unit for substrates, a gas supply unit for process gases, and a plasma generating unit. The apparatus is designed to improve the treatment of substrates through a sophisticated inspection unit that ensures optimal performance.
Career Highlights
Jae Hwan Cho is currently associated with Semes Co., Ltd., where he continues to push the boundaries of substrate treatment technology. His work has been instrumental in advancing the capabilities of the company in this specialized field.
Conclusion
Jae Hwan Cho's contributions to substrate treatment technology exemplify the innovative spirit of modern inventors. His patent reflects a commitment to enhancing industrial processes, making him a key figure in his area of expertise.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile