Company Filing History:
Years Active: 1989
Title: J William Dockrey: Innovator in Semiconductor Technology
Introduction
J William Dockrey is a notable inventor based in Austin, TX, recognized for his contributions to semiconductor technology. He holds a patent that showcases his innovative approach to patterning in semiconductor devices. His work has significant implications for the electronics industry, particularly in enhancing the precision of semiconductor manufacturing.
Latest Patents
Dockrey's most recent patent is titled "Micron and submicron patterning without using a lithographic mask." This electronic process is designed to create small dimensioned patterns in semiconductor devices. In one embodiment, the pattern electrically separates two areas of the substrate by less than a micron. The process utilizes a lithographic mask that does not require dimensions as small as those being formed on the semiconductor device. Instead, it forms a predetermined pattern with at least one separation region by irradiating and developing a photoresist material. A layer of buffer material below the photoresist reacts with a reactive ion etch to create a separation area with sloping sides made of polymer filaments. The sloped sides of the separation region allow for a separation dimension in the substrate that is significantly smaller than the corresponding dimension required on the lithographic mask.
Career Highlights
Dockrey has made significant strides in his career, particularly during his tenure at Motorola Corporation. His work has contributed to advancements in semiconductor technology, making him a valuable asset in the field. With a patent portfolio that includes 1 patent, he has demonstrated his ability to innovate and push the boundaries of technology.
Collaborations
Throughout his career, Dockrey has collaborated with esteemed colleagues, including James R Pfiester and Louis C Parrillo. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies in the semiconductor industry.
Conclusion
J William Dockrey's contributions to semiconductor technology through his innovative patent work exemplify the impact of dedicated inventors in the field. His advancements not only enhance manufacturing processes but also pave the way for future innovations in electronics.