Jürgen Bruch

Title: Jürgen Bruch: Innovator in Plasma Impedance Regulation

Introduction: Jürgen Bruch, an exceptional inventor located in Nidderau, Germany, has made significant contributions to the field of plasma technology. His groundbreaking work encompasses the development of a device for the regulation of plasma impedance, demonstrating his commitment to advancing innovation in this specialized area.

Latest Patents: Bruch holds a notable patent for a "Device for the regulation of a plasma impedance." This invention is designed for use in a vacuum chamber, where at least one electrode is connected to an AC generator. This generator operates as a free-running oscillator, adjusting its frequency to match the resonance frequency of the variable plasma impedance it encounters. By detecting changes in the plasma impedance, which also alters the resonance frequency, the device enables modulation of important parameters such as voltage, current, power, or gas inflow based on the relationship between the resonance frequency and a predefined reference frequency value.

Career Highlights: Bruch is affiliated with Applied Films GmbH & Co. KG, where he applies his expertise in plasma technology to drive innovative solutions. His work at Applied Films demonstrates his focus on harnessing technology to improve the capabilities and efficiency of plasma applications.

Collaborations: Throughout his career, Bruch has collaborated with fellow engineer Thomas Willms. Their partnership underscores the strength of teamwork in navigating the complexities of invention and innovation in engineering.

Conclusion: Jürgen Bruch stands out as a prominent figure in the realm of plasma technology with his striking patent and collaborative efforts. His contributions not only showcase his inventive spirit but also pave the way for further advancements in plasma impedance regulation, reflecting the essence of innovation in today's technological landscape.