Applied Films Gmbh & Co. Kg

Applied Materials, Inc.

Jürgen Bruch

Uwe Hoffmann

Thomas Willms

Elisabeth Sommer

Manuel Dieguez-Campo

The invention relates to a device for the regulation of a plasma impedance in a vacuum chamber, wherein at least one electrode is connected to an AC generator. This AC generator is a free-running [oscillator], whose frequency adjusts to the resonance frequency of the load upon which it acts. This load comprises fixed circuit elements and a variable plasma impedance. If the plasma impedance is changed, with it the resonance frequency is also changed. The plasma impedance can thus be varied by acquisition of the resonance frequency and by presetting of a reference frequency value, for example thereby that the voltage, the current, the power or the gas inflow is varied as a function of the difference between resonance frequency and reference frequency value.

Growing community of inventors

Nidderau, Germany

Jürgen Bruch