Location History:
- Hino, JA (1976)
- Hino, JP (1980)
Company Filing History:
Years Active: 1976-1980
Title: Iwao Omae: Innovator in Photoconductive Resins
Introduction
Iwao Omae is a notable inventor based in Hino, Japan. He has made significant contributions to the field of photoconductive materials, holding a total of 2 patents. His work focuses on developing innovative solutions that enhance the performance of electrophotographic systems.
Latest Patents
Omae's latest patents include a photoconductive resin containing tertiary amino groups. This invention features an electrophotographic sensitive layer that utilizes a new soluble photoconductive resin. The resin contains an aromatic tertiary amino group, which serves as a photoconductive functional group. The design ensures that the benzene nuclei are bonded through a methylene group, maintaining the solubility of the resin. Another significant patent involves a process for preparing alkenylbenzenes. This process entails reacting an alkylbenzene with 1,3-butadiene at elevated temperatures, using a specific alkali metal catalyst in the absence of oxygen and moisture.
Career Highlights
Iwao Omae is currently associated with Teijin Limited, a company known for its advancements in materials science. His work at Teijin has allowed him to explore and develop innovative materials that have practical applications in various industries.
Collaborations
Omae has collaborated with notable coworkers, including Takeo Shima and Takanori Urasaki. Their combined expertise has contributed to the successful development of new technologies in the field of photoconductive materials.
Conclusion
Iwao Omae's contributions to the field of photoconductive resins highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to enhancing the efficiency and effectiveness of electrophotographic systems.