Ivan Zyulkov

Title: Inventor Spotlight: Ivan Zyulkov

Introduction

Ivan Zyulkov is a notable inventor based in Leuven, Belgium. He has made significant contributions to the field of semiconductor fabrication, especially through his innovative methods related to patterning structures.

Latest Patents

Ivan holds a patent for a method of patterning a target layer. This patented technology focuses on enhancing semiconductor fabrication processes. The method involves forming a plurality of parallel material lines on a target layer, with gaps that expose the underlying layer. By utilizing a sacrificial material and selective deposition processes, his innovation allows for the creation of a block mask that effectively patterns the target layer. This advancement not only improves efficiency but also precision in semiconductor manufacturing.

Career Highlights

Throughout his career, Ivan Zyulkov has worked at prominent institutions, including imec and Katholieke Universiteit Leuven. His experiences at these organizations have greatly influenced his understanding and expertise in semiconductor technologies, leading to his developments in the patently related methods.

Collaborations

In his professional journey, Ivan has collaborated with talented individuals such as Basoene Briggs and Katia Devriendt. These partnerships have likely fostered innovative ideas and solutions that have propelled his research and inventions forward.

Conclusion

With his patent and extensive experience, Ivan Zyulkov has made a lasting impact in the semiconductor industry. His innovative method of patterning target layers highlights the importance of continuous advancements in technology and the role of inventors in shaping the future.