Ivan A Ocanada

Title: Ivan A Ocanada: Innovator in Chemical Mechanical Polishing Technology

Introduction

Ivan A Ocanada is a notable inventor based in Modesto, CA (US). He has made significant contributions to the field of chemical mechanical polishing technology. With a total of 2 patents to his name, Ocanada has developed innovative solutions that enhance the efficiency and effectiveness of slurry distribution in polishing processes.

Latest Patents

Ocanada's latest patents focus on an apparatus and method for the distribution of slurry in chemical mechanical polishing. The technology involves providing slurry to the surface of the polishing pad through a central port or by dripping it from a slurry feed tube. A slurry wiper, which may feature one or more flexible members, is designed to sweep the slurry evenly and thinly across the polishing pad. Additionally, a control system is implemented to coordinate the distribution of slurry with the motion of the carrier head, ensuring optimal performance during the polishing process.

Career Highlights

Ivan A Ocanada is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to apply his innovative ideas and contribute to advancements in technology.

Collaborations

Ocanada has collaborated with several talented individuals in his field, including William L Guthrie and Semyon Spektor. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Ivan A Ocanada is a distinguished inventor whose work in chemical mechanical polishing technology has made a significant impact. His innovative patents and contributions to Applied Materials, Inc. highlight his dedication to advancing the field.