Company Filing History:
2 out of 832,912 Years Active: 2003-2004
Title: Innovations by Itsuji Yoshikawa
Introduction
Itsuji Yoshikawa is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of materials science, particularly in the development of metal film patterns. With a total of 2 patents, his work showcases innovative techniques that enhance manufacturing processes.
Latest Patents
Yoshikawa's latest patents include a method for creating a metal film pattern and a SnO film with a prescribed pattern feature. This process involves forming a SnO film on a substrate using a wet film-formation technology, such as the sol-gel method. Following this, a Ni film is deposited on the SnO film through an electroless plating method. This method is unique as it is conducted in the presence of sulfur-containing compounds, which include thiosulfates, thiocyanates, and sulfur-containing organic compounds.
Career Highlights
Throughout his career, Yoshikawa has focused on advancing the techniques used in film formation and metal deposition. His innovative approaches have led to improved efficiency and effectiveness in manufacturing processes. His patents reflect a deep understanding of material properties and their applications in technology.
Collaborations
Yoshikawa has worked alongside talented colleagues, including Yoshihiro Izumi and Yoshimasa Chikama. Their collaborative efforts have contributed to the success of various projects and innovations in their field.
Conclusion
Itsuji Yoshikawa's contributions to the field of materials science through his patents demonstrate his commitment to innovation. His work continues to influence manufacturing techniques and inspire future advancements in technology.