Isao Nemoto is a prominent inventor based in Hitachinaka, Japan. He has made significant contributions to the field of surface measurement technology, holding a total of 4 patents. His work focuses on developing advanced methods and apparatuses for detecting crystal defects in semiconductor wafers.

Latest Patents

One of his latest patents is a surface measurement apparatus designed for detecting crystal defects of wafers. This innovative device supports samples flatly and with high precision using a sample chuck, allowing for easy mounting and dismounting. The apparatus features a wafer lifting mechanism that is strategically positioned away from the rotating system of a rotatable wafer chuck. This design enables the wafer to be lifted from a supporting surface by moving the lifting mechanism upward, allowing pins to penetrate through holes in the wafer chuck while the chuck remains stationary at the sample mounting-and-dismounting position.

Another notable patent is a method for measuring crystal defects and the equipment that utilizes this method. This invention allows for the measurement of inner defects in samples with high accuracy, even when the sample surface experiences irregularities due to flatness issues or inaccuracies in the sample movement stage. The method involves slantingly irradiating incident light beams of two different wavelengths onto the moving sample surface. The inner defects are measured by detecting the scattering light that occurs from within the sample, using a detection optical system positioned above the sample surface. Additionally, a distance measurement means is incorporated to measure the surface height of the sample, ensuring precise control of the optical systems during measurement.

Career Highlights

Isao Nemoto is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to push the boundaries of surface measurement technology, contributing to advancements in the semiconductor industry.

Collaborations

Throughout his career, Isao has collaborated with notable colleagues, including Shigeru Matsui and Muneo Maeshima. These collaborations have fostered a creative environment that has led to significant technological advancements.

Conclusion

Isao Nemoto's contributions to surface measurement technology have made a lasting impact on the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in the field.

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