Akiruno, Japan

Isamu Komiya

This inventor holds 1 USPTO granted patent. Top assignee: Aera Japan Ltd.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Isamu Komiya. Retrieved from https://idiyas.com/inventor/isamu-komiya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Isamu Komiya: Innovator in Flow Control Technology

Introduction

Isamu Komiya is a notable inventor based in Akiruno, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative designs and patents. His work focuses on enhancing the efficiency and reliability of manufacturing processes.

Latest Patents

Komiya holds a patent for a "Flow control valve utilizing sonic nozzle." This invention is crucial for semiconductor manufacturing processes. The flow control valve employs a pressure sensor positioned between the valve and a subsequent sonic nozzle. This setup allows for the detection of gas pressure, which is then fed back to the valve to regulate the flow effectively.

Career Highlights

Isamu Komiya is currently employed at Aera Japan Ltd., where he continues to develop advanced technologies for the semiconductor industry. His expertise in flow control systems has positioned him as a key player in his field.

Collaborations

Komiya collaborates with Masahiro Nambu, a fellow innovator in the industry. Together, they work on projects that aim to push the boundaries of semiconductor manufacturing technology.

Conclusion

Isamu Komiya's contributions to flow control technology exemplify the importance of innovation in the semiconductor manufacturing sector. His patent and ongoing work at Aera Japan Ltd. highlight his commitment to advancing industry standards.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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