Company Filing History:
Years Active: 2006-2007
Title: Isak Konkashbaev: Innovator in Extreme Ultraviolet Lithography
Introduction
Isak Konkashbaev is an accomplished inventor based in Bolingbrook, IL, USA, renowned for his groundbreaking work in the field of plasma physics and lithography. With two patents to his name, his contributions have significantly advanced the technology for generating extreme ultraviolet (EUV) electromagnetic waves, essential for next-generation lithographic applications.
Latest Patents
Konkashbaev's most recent innovations include two notable patents:
1. **Method for Plasma Formation for Extreme Ultraviolet Lithography - Theta Pinch**
This patent outlines a novel device and methodology for generating extremely short-wave ultraviolet electromagnetic waves. By utilizing a theta pinch plasma generator, the invention produces electromagnetic radiation in the range of 10 to 20 nm. The device comprises an axially aligned open-ended pinch chamber, alongside a system for generating a magnetic field that discharges plasma and produces the desired electromagnetic wave.
2. **Method for Generating Extreme Ultraviolet with Mather-Type Plasma Accelerators for Use in Extreme Ultraviolet Lithography**
This inventive method utilizes two intersecting plasma beams from plasma accelerators to generate radiation specifically in the extreme ultraviolet wavelength range. The approach involves axially aligned counter-streaming plasmas that collide to deliver an intense source of electromagnetic radiation, particularly at the 13.5 nm wavelength. The innovative use of tin or lithium-covered electrodes enhances the efficiency of the photon-emitting gas source.
Career Highlights
Konkashbaev currently represents the United States Department of Energy, where he is instrumental in advancing research on plasma technologies. His work is pivotal in the field of extreme ultraviolet lithography, which plays a crucial role in semiconductor manufacturing.
Collaborations
Throughout his career, Isak has collaborated with esteemed colleagues such as Ahmed Hassanein and Bryan J Rice, who have also made significant contributions to plasma physics and engineering. Their collective efforts have fostered an environment of innovation and advancement within their field.
Conclusion
Isak Konkashbaev's contributions to the field of extreme ultraviolet lithography through his pioneering patents reflect his dedication to innovation. With his ongoing work at the Department of Energy, he continues to influence the landscape of plasma technology and its applications in advanced manufacturing processes.