Yverdon-les-Bains, Switzerland

Ioulia Tsvetkova


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Ioulia Tsvetkova: Innovator in Plasma Technology

Introduction

Ioulia Tsvetkova is a prominent inventor based in Yverdon-les-Bains, Switzerland. She has made significant contributions to the field of plasma technology, particularly with her innovative designs and applications. Her work is characterized by a commitment to advancing the capabilities of plasma generators.

Latest Patents

Ioulia Tsvetkova holds a patent for a four-nozzle plasma generator designed for forming an activated jet. This advanced device comprises two anode electrode chambers and two cathode electrode chambers connected to DC power sources. It generates four plasma jets, whose shape and path are determined by an external magnetic field system. The plasma jets converge in a central area where the material to be processed is injected, forming a single plasma stream. The nozzles are symmetrically arranged on a hood that includes a flat water-cooled diaphragm with a central aperture. This innovative design enhances the efficiency and effectiveness of plasma processing.

Career Highlights

Ioulia Tsvetkova is currently employed at Tepla AG, where she continues to develop cutting-edge technologies in plasma applications. Her work has garnered attention for its potential to revolutionize various industrial processes. With a focus on practical applications, she has positioned herself as a key player in the field of plasma technology.

Collaborations

Throughout her career, Ioulia has collaborated with notable professionals in her field, including Vladimir Enguelcht and Pavel Koulik. These partnerships have contributed to her success and the advancement of her innovative projects.

Conclusion

Ioulia Tsvetkova is a trailblazer in the realm of plasma technology, with her patented innovations paving the way for future advancements. Her dedication to research and development continues to inspire others in the field.

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