Insu Ha

Title: Insu Ha - Innovator in Tungsten Technology

Introduction

Insu Ha is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of methods for forming low resistivity tungsten features. His innovative work has implications for improving the efficiency and performance of electronic devices.

Latest Patents

Insu Ha holds 1 patent for his invention titled "Methods for forming low resistivity tungsten features." This patent describes a method of forming a structure on a substrate that includes a tungsten-containing layer with a nucleation layer and a fill layer. The process involves disposing a nucleation layer along the sidewalls of an opening, which contains boron and tungsten. The fill layer is then placed over the nucleation layer within the opening, resulting in a tungsten-containing layer with a resistivity of about 16 μΩ·cm or less. The thickness of this layer ranges from about 200 Å to about 600 Å, and it is designed to be half the width of the tungsten-containing layer disposed within the opening.

Career Highlights

Insu Ha is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to focus on advancing technologies that enhance the manufacturing processes of electronic components.

Collaborations

Insu has collaborated with several talented individuals in his field, including Peiqi Wang and Cheng Cheng. These collaborations have contributed to the development of innovative solutions in semiconductor technology.

Conclusion

Insu Ha's contributions to tungsten technology and semiconductor manufacturing highlight his role as an influential inventor. His patent on low resistivity tungsten features showcases his commitment to advancing the industry and improving electronic device performance.