Location History:
- Suwon, KR (2017)
- Seoul, KR (2022)
Company Filing History:
Years Active: 2017-2022
Title: Inhwan Park - Innovator in Substrate Support Technology
Introduction
Inhwan Park is an inventor based in Suwon-si, South Korea. He is known for his innovative contributions to substrate support devices and processing apparatuses. Although he currently holds no granted patents, his work in this field demonstrates a commitment to advancing technology.
Latest Patent Applications
Inhwan Park has submitted several notable patent applications. One of his latest applications is for a "SUBSTRATE SUPPORT DEVICE." This device includes a chuck plate, a shaft connected to the center lower end of the chuck plate, a heater unit provided inside the chuck plate, and an electrode unit also located within the chuck plate. The design features a jumper unit that connects the electrode and heater units, ensuring efficient power supply. The electrode unit consists of a center electrode and a first electrode arranged in a ring shape around the center electrode. The jumper unit includes a first jumper connected to the first electrode and a center jumper connected to the center electrode, enhancing the device's functionality.
Another significant application is for a "SUBSTRATE SUPPORTER." This invention relates to substrate supporters and processing apparatuses. The substrate supporter features an upper surface for loading a substrate, a base, and an outer dam extending along the edge of the base. It also includes a contact band connected to the outer dam, which extends along the circumferential direction of the base. A first contact pattern is disposed adjacent to the contact band, extending into the inside of the contact band, with a larger area than the area where the contact band overlaps with the substrate.
Conclusion
Inhwan Park's innovative work in substrate support technology showcases his potential as an inventor. His latest patent applications reflect a focus on enhancing substrate processing efficiency. As he continues to develop his ideas, he may contribute significantly to advancements in this field.