Company Filing History:
Years Active: 2024-2025
Title: In Hwang Park: Innovator in Substrate Processing Technology
Introduction
In Hwang Park is a notable inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of substrate processing technology, holding a total of 3 patents. His innovative work focuses on enhancing the efficiency and effectiveness of various processing apparatuses.
Latest Patents
Among his latest patents are the exhaust assembly and liquid processing apparatus, along with substrate processing equipment that incorporates these advancements. The exhaust assembly is designed to create a uniform airflow during the gas discharge process, ensuring optimal performance in substrate processing. This assembly features multiple intake ports, a body portion for symmetrical gas discharge paths, and a guide portion that directs the gas flow to maintain balance. Additionally, the liquid processing apparatus includes a housing with a treating container, substrate support unit, and an exhaust unit to manage fumes generated during the treatment process.
Career Highlights
In Hwang Park is currently employed at Semes Co., Ltd., where he continues to develop innovative solutions in substrate processing. His work has been instrumental in advancing the technology used in various industrial applications.
Collaborations
He collaborates with talented coworkers, including Kyung Min Kim and Joo Jib Park, who contribute to the innovative projects at Semes Co., Ltd.
Conclusion
In Hwang Park's contributions to substrate processing technology exemplify his commitment to innovation and excellence in his field. His patents reflect a deep understanding of the complexities involved in processing apparatuses, making him a valuable asset to his company and the industry as a whole.