Company Filing History:
Years Active: 2020-2023
Title: In-chan Hwang: Innovator in Integrated Circuit Technology
Introduction
In-chan Hwang is a prominent inventor based in Siheung-si, South Korea. He has made significant contributions to the field of integrated circuit technology, holding a total of 5 patents. His work has been instrumental in advancing the capabilities of electronic devices.
Latest Patents
One of Hwang's latest patents is titled "Integrated circuit device and method of fabricating the same." This invention describes an integrated circuit device featuring a fin-type active region that extends on a substrate in a first horizontal direction. A gate line intersects this region in a second horizontal direction. The design includes a source/drain region positioned at one side of the gate line, with an insulating cover extending parallel to the substrate. The source/drain contact vertically extends through the insulating cover, connecting to the source/drain region. Additionally, a fin isolation insulating unit extends into the fin-type active region, enhancing the device's functionality.
Career Highlights
Hwang is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and develop cutting-edge technologies. His expertise in integrated circuits has positioned him as a key player in the electronics industry.
Collaborations
Throughout his career, Hwang has collaborated with notable colleagues, including Hwi-Chan Jun and Heon-jong Shin. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
In-chan Hwang's contributions to integrated circuit technology exemplify the spirit of innovation. His patents and collaborations reflect a commitment to advancing electronic device capabilities. Hwang's work continues to influence the industry and inspire future inventors.