Ii: Haruo

Title: The Innovations of Ii: Haruo

Introduction

Ii: Haruo is a notable inventor based in Akishima, Japan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique process for fabricating phase shift masks.

Latest Patents

Ii: Haruo holds 1 patent for his invention titled "Process for fabricating phase shift mask and process of semiconductor." This patent outlines a method where the data of a mask pattern is separated into a real pattern data layer and a phase shift pattern data layer. The process includes verifying whether the mask pattern meets regulations for both in-phase and out-of-phase patterns, ensuring optimal performance in semiconductor applications.

Career Highlights

Throughout his career, Ii: Haruo has worked with prominent companies such as Hitachi Ltd and Hitachi VLSI Engineering Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Ii: Haruo has collaborated with notable coworkers, including Toshitsugu Takekuma and Kazuya Ito. Their combined expertise has fostered innovation in their respective fields.

Conclusion

Ii: Haruo's contributions to semiconductor technology through his patent and collaborations highlight his role as a significant inventor in the industry. His work continues to influence advancements in the field.