Company Filing History:
Years Active: 2010
Title: Ichiro Uehara: Innovator in Plasma-Resistant Technology
Introduction
Ichiro Uehara is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of plasma-resistant components used in semiconductor manufacturing.
Latest Patents
Uehara holds a patent for a conductive, plasma-resistant member. This invention is designed for exposure to a halogen-based gas plasma atmosphere. The member features a substrate with a thermal spray coating composed of yttrium metal or a mixture of yttrium metal with yttrium oxide and/or yttrium fluoride. This innovative design confers electrical conductivity while enhancing erosion resistance against halogen-based corrosive gases or plasmas. As a result, it effectively reduces particle contamination during plasma etching processes in semiconductor and flat panel display manufacturing equipment.
Career Highlights
Ichiro Uehara is currently employed at Shin-Etsu Chemical Co., Ltd., a leading company in the chemical industry. His work focuses on advancing materials that can withstand harsh plasma environments, which is crucial for the efficiency and reliability of semiconductor manufacturing.
Collaborations
Uehara has collaborated with notable colleagues, including Takao Maeda and Yuuichi Makino. Their combined expertise has contributed to the successful development of innovative materials and technologies in their field.
Conclusion
Ichiro Uehara's contributions to plasma-resistant technology highlight his role as an influential inventor in the semiconductor industry. His work continues to impact the efficiency of manufacturing processes, showcasing the importance of innovation in materials science.