Itami, Japan

Ichiro Shimizu


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 2004-2007

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2 patents (USPTO):Explore Patents

Title: Ichiro Shimizu: Innovator in Substrate Support Technology

Introduction: Ichiro Shimizu is a notable inventor based in Itami, Japan. He has made significant contributions to the field of substrate support technology, holding 2 patents that enhance the efficiency of substrate handling processes. His work is particularly relevant in industries that require precision in substrate manipulation.

Latest Patents: Ichiro Shimizu's latest patents focus on methods for dechucking a substrate. One patent describes a substrate support assembly that includes a support surface, a first set of lift pins, and additional lift pins that are movably disposed through the substrate support. In this design, the first set of lift pins projects a longer distance from the support surface than the other lift pins when in an actuated position. Another aspect of his invention outlines a method for effectively dechucking a substrate, which involves projecting lift pins to different heights above the substrate support surface.

Career Highlights: Ichiro Shimizu is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His innovative work has contributed to advancements in substrate support systems, making processes more efficient and reliable.

Collaborations: Ichiro has collaborated with notable coworkers such as Quanyuan Shang and William Reid Harshbarger. Their combined expertise has furthered the development of cutting-edge technologies in substrate handling.

Conclusion: Ichiro Shimizu's contributions to substrate support technology exemplify the impact of innovation in the semiconductor industry. His patents reflect a commitment to improving efficiency and precision in substrate manipulation processes.

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