Ichiro Nunomura

Title: Ichiro Nunomura: Innovator in Substrate Processing Technology

Introduction

Ichiro Nunomura is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and security of processing apparatuses.

Latest Patents

Nunomura's latest patents include a substrate processing apparatus and a recording medium designed to change the atmosphere of a transfer chamber. This innovative configuration features an intake damper and fan that communicate with an intake port, allowing air to be sucked into the transfer chamber connected to a process chamber. Additionally, it includes a valve for an inert gas introduction pipe, which supplies inert gas to the transfer chamber. The apparatus is equipped with an exhaust fan and a first exhaust valve, along with a switch that allows users to select between an atmospheric mode and a purge mode. A controller is also integrated to manage these components effectively.

Another significant patent involves a processing apparatus, controller, and processing system aimed at preventing unauthorized personnel from editing files without permission. This system includes an operating unit that displays an operation screen for editing an integrated file, which contains non-encrypted data, a drawing file, and encrypted data. The memory unit stores the integrated file, while the arithmetic unit compares the item file with decrypted data to ensure secure editing.

Career Highlights

Throughout his career, Nunomura has worked with prominent companies such as Kokusai Electric Corporation and Hitachi Kokusai Electric Inc. His experience in these organizations has allowed him to develop and refine his innovative ideas in substrate processing technology.

Collaborations

Nunomura has collaborated with notable coworkers, including Satoru Takahata and Tsukasa Iida. Their combined expertise has contributed to the advancement of technology in their respective fields.

Conclusion

Ichiro Nunomura's contributions to substrate processing technology and his innovative patents reflect his dedication to enhancing efficiency and security in processing systems. His work continues to influence the industry and inspire future innovations.