Osaka, Japan

Ichiro Fujiwara


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2001-2002

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2 patents (USPTO):Explore Patents

Title: Ichiro Fujiwara: Innovator in Positron Source Technology

Introduction

Ichiro Fujiwara is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of positron source technology. With a total of 2 patents, his work has garnered attention in both academic and industrial circles.

Latest Patents

Fujiwara's latest patents include a positron source and a method of preparing the same, along with an automated system for supplying the same. The invention provides a positron source that essentially consists of a carbon member with fluorine bound onto its surface. The preparation method involves irradiating a solution containing both water and a small amount of natural fluorine ions with a beam of charged particles to generate fluorine. An electric current is then passed through the solution using a carbon member as an anode, which causes the generated fluorine to bind onto the surface of the carbon member.

Career Highlights

Ichiro Fujiwara is associated with Riken Corporation, a leading research institution in Japan. His work at Riken has allowed him to explore innovative solutions in the field of positron technology. His contributions have been instrumental in advancing the understanding and application of positron sources.

Collaborations

Fujiwara has collaborated with notable colleagues, including Yoshiko Ito and Ren Iwata. These collaborations have enriched his research and have led to further advancements in his field.

Conclusion

Ichiro Fujiwara's innovative work in positron source technology highlights his role as a key inventor in this specialized area. His patents and collaborations continue to influence the field, showcasing the importance of research and development in advancing scientific knowledge.

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