Luodong, Taiwan

I-Hong Lin


Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015-2017

Loading Chart...
3 patents (USPTO):Explore Patents

Title: I-Hong Lin: Innovator in Resin Composition and Polyphenylene Ether

Introduction

I-Hong Lin is a notable inventor based in Luodong, Taiwan. He has made significant contributions to the field of materials science, particularly in resin compositions and polyphenylene ether. With a total of 3 patents to his name, Lin's work has implications for various industrial applications.

Latest Patents

Lin's latest patents include innovative developments in resin composition, prepreg, and substrate technologies. One of his patents discloses a resin composition that includes a polyphenylene ether compound and a bismaleimide. This resin composition is utilized in a prepreg, which is a cured product that can be used in various substrates. Another significant patent focuses on aqueous-phase catalyst compositions and methods for preparing polyphenylene ether. This patent describes an aqueous-phase catalyst composition that includes metal ions such as copper, nickel, manganese, or iron, combined with a water-soluble linear polymer. The method outlined in this patent provides a novel approach to synthesizing polyphenylene ether.

Career Highlights

I-Hong Lin is affiliated with the Industrial Technology Research Institute, where he conducts research and development in advanced materials. His work has been instrumental in advancing the understanding and application of resin technologies in various industries.

Collaborations

Lin collaborates with esteemed colleagues, including Chung-Cheng Lin and Wei-Ta Yang, to further enhance the research and development efforts in his field.

Conclusion

I-Hong Lin's innovative contributions to resin composition and polyphenylene ether highlight his role as a leading inventor in materials science. His patents reflect a commitment to advancing technology and improving industrial applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…