I-Chin Sung

Title: The Innovations of I-Chin Sung

Introduction

I-Chin Sung is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of lithography through his innovative designs and patents. His work is particularly recognized for its impact on the semiconductor manufacturing process.

Latest Patents

I-Chin Sung holds a patent for an "Alignment mark of mask." This lithography mask includes an alignment mark that features a first bar, a second bar crossing the first bar, and a specific pattern with different signatures. The first and second bars connect to the second bar, showcasing his inventive approach to enhancing lithography techniques.

Career Highlights

I-Chin Sung is associated with Visera Technologies Company Limited, where he applies his expertise in lithography and semiconductor technology. His role at the company allows him to work on cutting-edge innovations that drive advancements in the industry.

Collaborations

Throughout his career, I-Chin Sung has collaborated with talented individuals such as Chih-Shen Fan and Li-Wei Chen. These partnerships have fostered a creative environment that encourages the development of new ideas and technologies.

Conclusion

I-Chin Sung's contributions to lithography and semiconductor technology are noteworthy. His patent and collaborations reflect his commitment to innovation in the field. His work continues to influence the industry and inspire future advancements.