Company Filing History:
Years Active: 2013
Title: Innovations by Hyunjong Jin in Photolithography
Introduction
Hyunjong Jin is an accomplished inventor based in Urbana, IL (US). He has made significant contributions to the field of photolithography through his innovative work on micromirrors and micromirror arrays. His research focuses on enhancing the efficiency and effectiveness of maskless photolithography systems and projection display devices.
Latest Patents
Hyunjong Jin holds a patent for "Mirror arrays for maskless photolithography and image display." This patent describes micromirrors and micromirror arrays that are particularly useful in maskless photolithography systems and projection display devices. The micromirrors consist of a polymer structural layer and a reflective dielectric multilayer, which allows for selective reflection and redirection of incoming electromagnetic radiation. This innovative design prevents damage to polymer materials due to excessive heating, as the reflective dielectric multilayers minimize heating of the micromirror components. Additionally, the patent outlines top-down fabrication methods for creating micromirrors with these advanced features.
Career Highlights
Hyunjong Jin is affiliated with the University of Illinois, where he continues to advance research in photolithography and related technologies. His work has garnered attention for its practical applications in various industries, particularly in improving display technologies and manufacturing processes.
Collaborations
Hyunjong Jin has collaborated with notable colleagues, including Kanti Jain and Junghun Chae. Their combined expertise has contributed to the development of innovative solutions in the field of photolithography.
Conclusion
Hyunjong Jin's contributions to the field of photolithography through his patent on micromirrors demonstrate his commitment to innovation and advancement in technology. His work not only enhances existing systems but also paves the way for future developments in the industry.