Hyun Min Park

Title: Innovations of Hyun Min Park

Introduction

Hyun Min Park is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of photoresist compositions, holding a total of 4 patents. His work focuses on enhancing the performance and efficiency of photoresist materials used in various applications.

Latest Patents

One of his latest patents is a photoresist composition that includes a chemically amplified resin. This composition features an alkali-soluble resin with a (meth)acrylate-based repeating unit, which is substituted with a heterocyclic compound via a divalent functional group. This innovative approach aims to improve the properties of photoresist materials. Another significant patent is for a multifunction photoacid generator and a chemically amplified photoresist composition for thick layers. This invention boasts excellent solubility and sensitivity, along with an anti-corrosion effect, which helps reduce scum and footing at the exposed parts after development.

Career Highlights

Hyun Min Park has worked with prominent companies such as LG Chem and the Korea Research Institute of Standards and Science. His experience in these organizations has allowed him to develop and refine his innovative ideas in the field of photoresist technology.

Collaborations

Throughout his career, he has collaborated with notable colleagues, including Tae Seob Lee and Jae Yong Song. These partnerships have contributed to the advancement of his research and inventions.

Conclusion

Hyun Min Park's contributions to the field of photoresist compositions demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving material performance, which is essential in various industrial applications.