Company Filing History:
Years Active: 2002
Title: Hyuk Kyoo Jang: Innovator in Semiconductor Technology
Introduction
Hyuk Kyoo Jang is a notable inventor based in Sungnam-shi, South Korea. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for enhancing the performance of semiconductor devices.
Latest Patents
Hyuk Kyoo Jang holds 1 patent for his invention titled "Method of forming an Al2O3 film in a semiconductor device." This patent discloses a method for forming an aluminum oxide film on a semiconductor device. The process involves depositing the aluminum oxide film using atomic layer deposition with trimethyl aluminum as the aluminum source and water as the oxygen reaction gas. Notably, the method introduces a nitrogen reaction gas simultaneously with the aluminum source, which increases the growth rate of the aluminum oxide film. This innovation also improves the prevention of hydrogen penetration into the underlying layers, thereby enhancing the charge storage characteristics in capacitors and overall electrical performance of various semiconductor elements.
Career Highlights
Hyuk Kyoo Jang is currently employed at Hyundai Electronics Industries Co. Ltd., where he continues to develop and refine technologies that advance semiconductor manufacturing processes. His work has been instrumental in improving the reliability and efficiency of semiconductor devices.
Collaborations
Hyuk Kyoo Jang collaborates with Chan Lim, contributing to the advancement of semiconductor technologies through shared expertise and innovative approaches.
Conclusion
Hyuk Kyoo Jang's contributions to semiconductor technology, particularly through his patented methods, highlight his role as a key innovator in the field. His work continues to influence the development of more efficient and reliable semiconductor devices.