Kunitachi, Japan

Hyou Takahashi


 

Average Co-Inventor Count = 2.8

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Kunitachi, JP (2014 - 2017)
  • Fukushima, JP (2020)

Company Filing History:


Years Active: 2014-2020

where 'Filed Patents' based on already Granted Patents

7 patents (USPTO):

Title: Hyou Takahashi: Innovator in Organic Residue Inspection and Photosensitive Resin Composition

Introduction

Hyou Takahashi is a prominent inventor based in Kunitachi, Japan. He has made significant contributions to the field of technology, particularly in methods related to organic residue inspection and photosensitive resin compositions. With a total of 7 patents to his name, Takahashi continues to push the boundaries of innovation.

Latest Patents

Takahashi's latest patents include an organic residue inspecting method and a liquid discharge head producing method. The organic residue inspecting method involves several steps, including bringing a liquid A into contact with a surface of a base material, measuring the contact angle of a liquid B on that surface, heating and drying the base material, and comparing the contact angles before and after drying. This method provides a reliable way to detect organic residues. Additionally, his photosensitive negative resin composition patent includes an epoxy-group-containing compound, a first onium salt with a specific cation moiety structure, and a second onium salt, showcasing his expertise in materials science.

Career Highlights

Hyou Takahashi is currently associated with Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. His work at Canon has allowed him to develop innovative solutions that enhance product performance and reliability.

Collaborations

Takahashi has collaborated with notable colleagues, including Ken Ikegame and Masako Shimomura. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Hyou Takahashi is a distinguished inventor whose work in organic residue inspection and photosensitive resin compositions has made a significant impact in his field. His ongoing contributions continue to inspire innovation and technological advancement.

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