Cheonan-si, South Korea

Hyeon Jun Lee

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.9

ph-index = 1


Location History:

  • Daejeon, KR (2019)
  • Chungcheongnam-do, KR (2024)
  • Cheonan-si, KR (2024)

Company Filing History:


Years Active: 2019-2024

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4 patents (USPTO):Explore Patents

Title: Hyeon Jun Lee: Innovator in Substrate Processing Technology

Introduction

Hyeon Jun Lee is a prominent inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of substrate processing, holding a total of 4 patents. His innovative work focuses on improving the efficiency and effectiveness of substrate treatment methods.

Latest Patents

Hyeon Jun Lee's latest patents include a substrate processing apparatus that features a nozzle unit and a substrate processing method. This method involves several steps, including a first nozzle moving step, a cleaning liquid supplying step, a second nozzle moving step, a drying gas supplying step, and a nozzle distance controlling step. Each of these steps is designed to enhance the processing of substrates in a controlled manner. Another notable patent is for an apparatus that treats substrates using liquid, which includes a spin chuck and a liquid supply unit. This apparatus is equipped with multiple nozzles and valve assemblies that work together to manage the flow of liquids effectively.

Career Highlights

Hyeon Jun Lee is currently employed at Semes Co., Ltd., where he continues to develop innovative solutions in substrate processing technology. His work has been instrumental in advancing the capabilities of substrate treatment methods, making them more efficient and reliable.

Collaborations

Throughout his career, Hyeon Jun Lee has collaborated with talented individuals such as Ju Hwan Lee and Yong Hoon Hong. These collaborations have contributed to the development of cutting-edge technologies in the field.

Conclusion

Hyeon Jun Lee is a dedicated inventor whose work in substrate processing technology has led to several important patents. His contributions continue to shape the industry and improve substrate treatment methods.

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