Hyeon Gyeong Shin

Title: Hyeon Gyeong Shin: Innovator in Substrate Treatment Technology

Introduction

Hyeon Gyeong Shin is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of advanced apparatuses that enhance the efficiency of substrate processing.

Latest Patents

Hyeon Gyeong Shin holds 1 patent for his invention titled "Support unit, and apparatus for treating substrate with the same." This patent describes a substrate treating apparatus that includes a housing, treating space, and a support unit designed to support a substrate. The apparatus features a dielectric plate, gas supply unit, and plasma source to generate plasma. It includes a top edge electrode and a bottom edge electrode, which work together to facilitate the treatment of substrates effectively.

Career Highlights

Hyeon Gyeong Shin is currently employed at Psk Inc., where he continues to innovate in the field of substrate treatment. His work has been instrumental in advancing the technology used in various applications, making processes more efficient and effective.

Collaborations

Throughout his career, Hyeon Gyeong Shin has collaborated with talented individuals such as Jong Chan Lee and Ju Young Park. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Hyeon Gyeong Shin is a prominent figure in the realm of substrate treatment technology. His contributions through patents and collaborations highlight his commitment to innovation and excellence in his field.