Company Filing History:
Years Active: 2025
Title: Hye Young Kim: Innovator in Extreme Ultraviolet Lithography
Introduction
Hye Young Kim is a notable inventor based in Bucheon-si, South Korea. He has made significant contributions to the field of extreme ultraviolet lithography, holding a total of 3 patents. His work focuses on innovative materials and methods that enhance the efficiency and effectiveness of lithography processes.
Latest Patents
Hye Young Kim's latest patents include a pellicle for extreme ultraviolet lithography containing amorphous carbon and a method for manufacturing the same. This application relates to a pellicle that includes a substrate with an opening, a support layer covering the opening, and a pellicle layer made of amorphous carbon. The pellicle layer may consist of a core layer and a capping layer, with at least one layer being amorphous carbon.
Another significant patent is the low-temperature direct growth method of multilayer graphene, which is used in a pellicle for extreme ultraviolet lithography. This method involves forming an etch stopper on a substrate, creating a seed layer, and utilizing a metal catalyst layer to grow multilayer graphene through interlayer exchange. The process is performed at low temperatures, specifically between 450° C. and 600° C.
Career Highlights
Hye Young Kim is affiliated with the Korea Electronics Technology Institute, where he continues to advance research in lithography technologies. His innovative approaches have positioned him as a key figure in the development of materials that improve lithography processes.
Collaborations
Hye Young Kim collaborates with several talented individuals, including Hyeong Keun Kim and Seul Gi Kim, who contribute to his research and development efforts.
Conclusion
Hye Young Kim's contributions to extreme ultraviolet lithography through his patents and research at the Korea Electronics Technology Institute highlight his role as an influential inventor in the field. His innovative work continues to pave the way for advancements in lithography technologies.
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