Location History:
- Yongin-si, KR (2021 - 2023)
- Suwon-si, KR (2023)
Company Filing History:
Years Active: 2021-2025
Title: Hwa-Sung Kim: Innovator in Photomask Cleaning Technology
Introduction
Hwa-Sung Kim is a talented inventor based in Hwasung-City, South Korea. She has made significant contributions to the field of photomask cleaning technology. Her innovative approach addresses the challenges associated with maintaining the integrity of photomasks used in semiconductor manufacturing.
Latest Patent Applications
Hwa-Sung Kim has filed a patent application for a method of cleaning a photomask. This method includes placing the photomask in a chamber, where it is subjected to a gas that does not react with the capping layer or forms an anti-oxidant layer. The gas is ionized using an energy beam, allowing contaminants to react with the ionized gas and convert into a by-product, which is then removed from the chamber. This innovative method aims to enhance the cleaning process while preserving the photomask's structural integrity.
Conclusion
Hwa-Sung Kim's work in photomask cleaning technology showcases her dedication to innovation in the semiconductor industry. Her patent application reflects her commitment to developing effective solutions for complex challenges.