Yongin, South Korea

Hwa-Sung Kim

This inventor holds 6 USPTO granted patents and 4 published patent applications and 7 EPO patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2021-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hwa-Sung Kim. Retrieved from https://idiyas.com/inventor/hwa-sung-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.5

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Yongin-si, KR (2021 - 2023)
  • Suwon-si, KR (2023)

Company Filing History:


Years Active: 2021-2025

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6 patents (USPTO):Explore Patents

Title: Hwa-Sung Kim: Innovator in Photomask Cleaning Technology

Introduction

Hwa-Sung Kim is a talented inventor based in Hwasung-City, South Korea. She has made significant contributions to the field of photomask cleaning technology. Her innovative approach addresses the challenges associated with maintaining the integrity of photomasks used in semiconductor manufacturing.

Latest Patent Applications

Hwa-Sung Kim has filed a patent application for a method of cleaning a photomask. This method includes placing the photomask in a chamber, where it is subjected to a gas that does not react with the capping layer or forms an anti-oxidant layer. The gas is ionized using an energy beam, allowing contaminants to react with the ionized gas and convert into a by-product, which is then removed from the chamber. This innovative method aims to enhance the cleaning process while preserving the photomask's structural integrity.

Conclusion

Hwa-Sung Kim's work in photomask cleaning technology showcases her dedication to innovation in the semiconductor industry. Her patent application reflects her commitment to developing effective solutions for complex challenges.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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