Hung-Min Chen

Title: Innovations of Inventor Hung-Min Chen

Introduction

Hung-Min Chen is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology and printed circuit board manufacturing. With a total of 2 patents, his work reflects a commitment to advancing electronic device integration.

Latest Patents

Hung-Min Chen's latest patents include a "Method for making dual silicide and germanide semiconductors." This innovative method involves several steps, such as providing a semiconductor substrate, forming a gate, and creating source/drain regions. The process also includes forming a first silicide and reducing spacer thickness to form a second silicide. Additionally, he has developed a "Method of manufacturing a multilayer printed circuit board with a built-in electronic device." This method outlines the creation of a substrate with a copper clad laminate and dielectric layers, allowing for the embedding of electronic devices within the circuit board.

Career Highlights

Throughout his career, Hung-Min Chen has worked with esteemed organizations such as National Applied Research Laboratories and Unitech Printed Circuit Board Corporation. His experience in these companies has allowed him to refine his skills and contribute to significant advancements in technology.

Collaborations

Hung-Min Chen has collaborated with talented individuals in his field, including Szu-Hung Chen and Yu-Sheng Lai. These collaborations have fostered innovation and have led to the development of groundbreaking technologies.

Conclusion

Hung-Min Chen's contributions to semiconductor technology and printed circuit board manufacturing highlight his role as a key innovator in the industry. His patents and collaborations reflect a dedication to enhancing electronic device functionality and integration.