Humihide Ikeda

Title: **Innovative Contributions of Humihide Ikeda**

Introduction

Humihide Ikeda, an inventive mind based in Akishima, Japan, has made significant strides in the field of chemical engineering. With a deep understanding of materials science and engineering processes, Ikeda has focused on the development of advanced apparatuses that enhance production efficiency in semiconductor manufacturing.

Latest Patents

Ikeda holds a noteworthy patent for a **Chemical Vapor Deposition Apparatus**. This innovative device features a reactor that is divided into a reaction space and a purging space, utilizing a susceptor designed to support a wafer. The apparatus is engineered to facilitate the loading and unloading of wafers through a loading chamber that communicates with the reactor via a gate. Notably, Ikeda's design includes exhaust units that help reduce pressure in both the reactor and loading chamber simultaneously. The susceptor is equipped with multiple recesses to assist in the precise placement of wafers, while a heated lamp unit operates from outside a transparent wall, ensuring optimal temperature control. This compact apparatus allows for the processing of one or a few wafers at a time, resulting in the production of a uniform film with high reproducibility and processing rates.

Career Highlights

Ikeda's professional journey is deeply intertwined with his role at the Nippon Telegraph and Telephone Public Corporation, where he has honed his skills in research and development. His dedication to advancing chemical processes has significantly impacted the efficiency of semiconductor manufacturing. With a solid educational background and practical experience, he continues to contribute to innovative solutions within the industry.

Collaborations

Throughout his career, Ikeda has collaborated with esteemed colleagues such as Satoshi Nakayama and Hideaki Takeuchi. These partnerships have fostered a culture of innovation, enabling them to tackle complex challenges in chemical vapor deposition and refine their collective knowledge in semiconductor technology.

Conclusion

Humihide Ikeda stands as a pivotal figure in the realm of chemical vapor deposition technology. His patent and contributions at the Nippon Telegraph and Telephone Public Corporation not only illustrate his technical prowess but also reflect his commitment to fostering advancements in semiconductor manufacturing. As industries continue to evolve, Ikeda's work will undoubtedly play a crucial role in shaping the future of technology.