Company Filing History:
Years Active: 2022
Title: Hugh MacDowell: Innovator in Substrate Channel Formation
Introduction
Hugh MacDowell is a notable inventor based in Clawson, MI (US). He has made significant contributions to the field of substrate technology, particularly through his innovative patent.
Latest Patents
Hugh MacDowell holds a patent for a "Method of forming channels within a substrate." This method involves molding a sacrificial component directly into the substrate and igniting it to create channels. The sacrificial component can include various oxidizing agents embedded in a polymeric matrix, which can range from 30 wt. % to 80 wt. % of the component. Additionally, the component may contain unoxidized metal powder fuels, flammable gas-filled polymeric bubbles, and other materials that enhance the channel formation process.
Career Highlights
Hugh MacDowell is currently employed at Gm Global Technology Operations, Inc. His work focuses on advancing methods for substrate manipulation, which has potential applications in various industries.
Collaborations
Throughout his career, Hugh has collaborated with talented individuals such as Anthony M Coppola and Nicole D Ellison. These partnerships have contributed to the development and refinement of his innovative ideas.
Conclusion
Hugh MacDowell's work in forming channels within substrates showcases his inventive spirit and dedication to advancing technology. His contributions are valuable to the field and highlight the importance of innovation in engineering.