Company Filing History:
Years Active: 1984
Title: Inventor Huei P. Kuo: Innovating Electron Beam Lithography
Introduction
Huei P. Kuo, a notable inventor based in San Jose, California, has made significant contributions to the field of electron beam lithography. With one patented innovation, her work demonstrates the integration of advanced technology and precise engineering. Her dedication to enhancing lithography systems is reflected in her notable patent, which focuses on electron beam blanking.
Latest Patents
Kuo holds a patent for an innovative electron beam blanker designed for use in electron beam lithography systems. This groundbreaking invention is capable of providing exposure rates on the order of 300MHz at beam currents of approximately 600nA. The technology features a condensing lens and a stigmator, ensuring that the electron beam is sharply focused in a plane perpendicular to the beam direction. A distinctive etched silicon knife-edge, coated with gold, is incorporated to achieve a precise cut-off as the beam sweeps past its edge. Furthermore, a deflector plate structure creates an electromagnetic field that enhances the performance of the system, significantly improving spot stability during operation.
Career Highlights
Huei P. Kuo has dedicated her career to pushing the boundaries of electron beam lithography at Hewlett-Packard Company. Her work not only showcases her inventiveness but also her ability to tackle complex challenges within the technological landscape. The impact of her contributions is evident within the lithography community, where her innovations continue to influence advancements in the field.
Collaborations
Throughout her career, Kuo has collaborated with esteemed coworkers John R. Kelly and Bernard M. Oliver. These partnerships have allowed her to thrive within an innovative environment, contributing to the development of technologies that are pivotal in advancing electronic design and manufacturing processes.
Conclusion
In summary, Huei P. Kuo represents a vital part of the evolution of electron beam lithography through her pioneering patent for an electron beam blanker. As a dedicated inventor at Hewlett-Packard Company, her efforts not only push the boundaries of technology but also inspire future innovations in the field. Her work exemplifies the importance of collaboration and creative thinking in the realm of scientific advancement.