Company Filing History:
Years Active: 2023
Title: Huang-wei Pan: Innovator in Photodiode Technology
Introduction
Huang-wei Pan is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of optoelectronics, particularly with his innovative work on photodiodes. His expertise and inventions have positioned him as a key figure in the industry.
Latest Patents
Huang-wei Pan holds a patent for a non-diffusion type photodiode. This invention features a substrate, a buffer layer, a light absorption layer, an intermediate layer, and a multiplication/window layer. The buffer layer is placed on the substrate, while the light absorption layer is situated on the buffer layer. The intermediate layer, which can be an I-type semiconductor layer or a graded refractive index layer, is positioned on the light absorption layer and has a first boundary. Notably, the multiplication/window layer is located on the intermediate layer and has a second boundary. In a top view, the first boundary surrounds the second boundary, with a distance of at least 1 micrometer between them. This design effectively reduces the generation of dark current, enhancing the performance of the photodiode.
Career Highlights
Huang-wei Pan is currently employed at Landmark Optoelectronics Corporation, where he continues to develop cutting-edge technologies in the field. His work has garnered attention for its innovative approach and practical applications in optoelectronic devices.
Collaborations
Huang-wei Pan collaborates with talented individuals such as Hung-Wen Huang and Yung-Chao Chen. Their combined expertise contributes to the advancement of technology in their field.
Conclusion
Huang-wei Pan's contributions to photodiode technology exemplify his innovative spirit and dedication to advancing optoelectronics. His patent for a non-diffusion type photodiode showcases his ability to address critical challenges in the industry.