Company Filing History:
Years Active: 2015
Title: Huamin Li - Innovator in Anti-Reflection Technology
Introduction
Huamin Li is a prominent inventor based in Suwon-si, South Korea. He is known for his innovative contributions to the field of optical technology, particularly in the development of anti-reflection structures. His work has significant implications for various applications in electronics and optics.
Latest Patents
One of Huamin Li's notable patents is titled "Anti-reflection structure using surface plasmon and high-K dielectric material and method of manufacturing the anti-reflection structure." This invention focuses on an anti-reflection structure that utilizes surface plasmons and high-k dielectric materials. The structure includes a high-k dielectric layer formed on a substrate, which allows incident light to pass through. Additionally, a nano-material layer is placed on top of the high-k dielectric layer. The high-k dielectric layer can consist of materials such as zirconium oxide (ZrO), hafnium oxide (HfO), titanium oxide (TiO), tantalum oxide (TaO), lanthanum oxide (LaO), yttrium oxide (YO), and aluminum oxide (AlO). This patent showcases his innovative approach to enhancing optical performance.
Career Highlights
Huamin Li is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology. His work at Samsung has allowed him to collaborate with leading experts in the field and contribute to cutting-edge research and development.
Collaborations
Throughout his career, Huamin Li has worked alongside talented colleagues, including Young-jun Park and Jong-min Kim. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Huamin Li's contributions to the field of anti-reflection technology exemplify his dedication to innovation. His patent on anti-reflection structures highlights the potential for advancements in optical technology. His work at Samsung Electronics Co., Ltd. and collaborations with esteemed colleagues further solidify his position as a leading inventor in this domain.