Hsuan-Fu Wang

Title: Hsuan-Fu Wang: Innovator in Atomic Layer Deposition and Particle Capture Technologies

Introduction

Hsuan-Fu Wang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the fields of atomic layer deposition and particle capture technologies. With a total of 6 patents to his name, Wang's work has advanced various industrial applications.

Latest Patents

One of Wang's latest patents is an atomic layer deposition method. This method involves a series of steps where a first precursor is injected into a chamber along a first direction. A bias power supply is activated to attract the first precursor to a substrate. Subsequently, a second precursor is injected into the chamber along a second direction that is perpendicular to the first. The bias power supply is again turned on to attract the second precursor to the substrate. In addition, a first inert gas is introduced into the chamber along the first direction, and the bias power supply is turned off to purge any unnecessary parts of the precursors or by-products. Finally, a second inert gas is injected into the chamber along the second direction to complete the purging process.

Another notable patent is a particles capturing system. This system includes a venturi filter device, a cyclone filter device, and a series of nozzles that facilitate air flow through the system. The venturi filter device features an air intake portion, a neck portion, and an air outlet portion. The cyclone filter device is positioned in the air outlet portion and has both an entrance and an exit. The nozzles, located inside the venturi filter device, are designed to be taller than the neck portion. As air flows through the system, it enters via the air intake, passes through the neck and nozzles, and then moves into the cyclone filter device, effectively capturing particles in the air.

Career Highlights

Hsuan-Fu Wang has worked with notable institutions such as the Industrial Technology Research Institute and National Taiwan University. His experience in these organizations has allowed him to develop and refine his innovative technologies.

Collaborations

Wang has collaborated with several professionals in his field, including Bing-Joe Hwang and Fu-Ching Tung. Their collective expertise has contributed to the advancement of the technologies Wang has developed.

Conclusion

Hsuan-Fu Wang is a distinguished inventor whose work in atomic layer deposition and particle capture systems