Hsin-Lun Hsieh

Title: Hsin-Lun Hsieh: Innovator in SERS Substrate Fabrication

Introduction

Hsin-Lun Hsieh is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of surface-enhanced Raman spectroscopy (SERS) through his innovative patent. His work focuses on the development of a method for fabricating SERS substrates, which are crucial for enhancing the detection capabilities in various applications.

Latest Patents

Hsieh holds a patent for a SERS substrate fabrication method and SERS detection method. This patent outlines a detailed fabrication process that includes several steps: preparing a hydrophilic membrane, dipping it in alcohol, immersing it in a chloride ion aqueous solution, and depositing silver or gold nanoparticles on the membrane through suction filtration. The hydrophilic membrane consists of specific weight percentages of materials such as PVDF, PTFE, PC, PES, nylon, and PVP, along with PMMA and PHEMA.

Career Highlights

Hsin-Lun Hsieh is currently associated with the National Defense Medical Center, where he applies his expertise in innovative technologies. His work at this institution highlights his commitment to advancing medical and defense-related applications through scientific research and development.

Collaborations

Hsieh collaborates with esteemed colleagues, including Jenn-Jong Young and Cheng-cheung Chen. Their combined efforts contribute to the advancement of research in their respective fields.

Conclusion

Hsin-Lun Hsieh is a prominent inventor whose work in SERS substrate fabrication has the potential to impact various scientific and medical fields. His innovative approach and collaboration with other experts underscore the importance of teamwork in driving technological advancements.