Taipei, Taiwan

Hsien-Chieh Lin


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2015-2019

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2 patents (USPTO):

Title: Hsien-Chieh Lin: Innovator of Antireflection Technologies

Introduction

Hsien-Chieh Lin is a prominent inventor based in Taipei, Taiwan. With a focus on innovative technologies, he has filed two patents that significantly contribute to advancements in the field of optics. His work has garnered attention for its practical applications and potential impact on various industries.

Latest Patents

One of Hsien-Chieh Lin's latest patents is a method for manufacturing an antireflection substrate structure. This process begins by providing a silicon wafer with a first rough surface. An antireflection optical film is then formed on the silicon wafer, conformally overlaying this initial rough surface. To enhance its properties, a surface treatment is conducted on the antireflection optical film, resulting in a hydrophilic surface that is distanced from the silicon wafer. Following this, a colloidal solution containing nano-balls is dropped onto the hydrophilic surface, allowing the nano-balls to adhere firmly. Finally, an etching process utilizes the adhered nano-balls as a mask, which enables the formation of a second rough surface with unique characteristics compared to the first rough surface.

Career Highlights

In his professional journey, Hsien-Chieh Lin has made notable contributions while working at Tatung Company and Tatung University. His roles have allowed him to engage in research and development, focusing on technological advancements and fostering innovation in optical materials.

Collaborations

Throughout his career, Hsien-Chieh Lin has collaborated with talented individuals, including his coworkers Chiung-Wei Lin and Jheng-Jie Ruan. These partnerships have facilitated a dynamic exchange of ideas, enhancing the innovation process.

Conclusion

Hsien-Chieh Lin is a key figure in the realm of optical technologies, particularly in the development of antireflection substrates. His inventive methods and collaborative spirit exemplify the essence of innovation, paving the way for future advancements in the field. As he continues to contribute to the world of patents and inventions, his work will undoubtedly inspire future generations of inventors.

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