Hsiang An

Title: Hsiang An: Innovator in Thin Film Technology

Introduction

Hsiang An is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of thin film technology, holding a total of 2 patents. His work focuses on innovative processes that enhance the efficiency and effectiveness of thin film formation.

Latest Patents

Hsiang An's latest patents include a groundbreaking process kit for ground return in thin film formation using plasma. This process kit features a substrate support and multiple electrical connectors, each designed with a tube and a shaft that includes a rim positioned inside the tube. The design allows for part of the shaft to move outside the tube while maintaining a seal that underlies a portion of the assembly. Another notable patent is for a gas diffuser mounting plate aimed at reducing particle generation in vacuum chambers. This assembly comprises a mounting plate with a hub, curved spokes, and gusset portions that enhance its structural integrity.

Career Highlights

Hsiang An is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to develop and refine his innovative ideas, contributing to advancements in thin film technology.

Collaborations

Hsiang An has collaborated with several talented individuals in his field, including Allen K Lau and Lai Zhao. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.

Conclusion

Hsiang An's contributions to thin film technology through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of materials engineering.