Namyangju, South Korea

Hoontaek Lee

This inventor holds 2 USPTO granted patents and 2 published patent applications and 1 EPO patent. Top assignee: Lg Display Co., Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hoontaek Lee. Retrieved from https://idiyas.com/inventor/hoontaek-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Location History:

  • Namyangju-si, KR (2021)
  • Gyeonggi-do, KR (2021)

Company Filing History:


Years Active: 2021

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2 patents (USPTO):Explore Patents

Title: Hoontaek Lee - Innovator in Substrate Processing Technology

Introduction

Hoontaek Lee is an inventor based in Suwon-si, South Korea. He is known for his contributions to substrate processing technology, particularly in the development of innovative apparatuses that enhance the efficiency and effectiveness of substrate processing.

Latest Patent Applications

Hoontaek Lee has several notable patent applications. One of his latest applications is for a focus ring alignment apparatus. This apparatus includes a frame, a sensing member connected to the frame, and an alignment module designed to adjust the position of the focus ring within a substrate processing apparatus. Another significant application is for an edge ring and apparatus for processing a substrate. This system is designed to protect the edge region of a substrate during a plasma process. It features an outer ring with uneven portions and an inner ring that rotates around the center point of the outer ring. The interaction between the inner and outer rings allows for control over the plasma sheath in the edge region of the substrate.

Conclusion

Hoontaek Lee's innovative approaches in substrate processing technology demonstrate his commitment to advancing the field. His latest patent applications reflect his focus on improving the efficiency and control of substrate processing methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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