Company Filing History:
2 out of 832,912 Years Active: 2003
Title: Innovations of Hong Xing Wang in Chemical Vapor Deposition
Introduction
Hong Xing Wang is a notable inventor based in Tokushima, Japan. He has made significant contributions to the field of chemical vapor deposition, particularly in the development of apparatus and methods for semiconductor films. With a total of two patents to his name, Wang's work is recognized for its innovative approach to enhancing the quality of semiconductor materials.
Latest Patents
Wang's latest patents focus on advancements in chemical vapor deposition technology. The first patent describes a chemical vapor deposition apparatus designed for semiconductor films. This apparatus features a horizontal tubular reactor, a susceptor, a heater, a feed gas introduction portion, and a reaction gas exhaust portion. Notably, part of the tubular reactor walls inclines downward from the upstream side of the feed gas passageway towards the downstream side. This design aims to improve the efficiency and quality of the deposition process.
The second patent outlines a method for chemical vapor deposition that utilizes the aforementioned apparatus. In this method, a feed gas is supplied in a horizontal tubular reactor parallel to a substrate, while a forcing gas is introduced perpendicularly. The flow rate of the forcing gas is strategically controlled to ensure high-quality crystal formation without the deposition of unwanted reaction products on the reactor walls. This innovation is particularly beneficial for large-sized substrates or when multiple substrates are processed simultaneously at high temperatures.
Career Highlights
Throughout his career, Hong Xing Wang has demonstrated a commitment to advancing semiconductor technology. His patents reflect a deep understanding of the challenges faced in chemical vapor deposition processes and offer practical solutions that enhance the quality of semiconductor films.
Collaborations
Wang has collaborated with notable colleagues in his field, including Shiro Sakai and Yukichi Takamatsu. These partnerships have likely contributed to the innovative nature of his work and the successful development of his patents.
Conclusion
Hong Xing Wang's contributions to chemical vapor deposition technology underscore his role as a significant inventor in the semiconductor industry. His innovative patents not only address existing challenges but also pave the way for future advancements in the field.