Company Filing History:
Years Active: 2007
Title: Holger Schührer: Innovator in Wafer Contamination Reduction
Introduction
Holger Schührer is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor manufacturing, particularly in methods that enhance the quality and reliability of wafers.
Latest Patents
Holger Schührer holds a patent for a method of reducing wafer contamination by removing under-metal layers at the wafer edge. This innovative technique involves using an etchant that comprises a diluted mixture of hydrofluoric acid and nitric acid. The method effectively removes metal and barrier materials, such as copper and tantalum-based barrier materials, from the wafer edge and bevel. It is designed to be compatible with existing etch modules, allowing for the removal of copper, barrier material, and dielectric material in a single etch step. This approach minimizes the risk of material delamination from the substrate edge, thereby improving the overall integrity of the wafers.
Career Highlights
Holger Schührer is currently employed at Advanced Micro Devices Corporation, a leading company in the semiconductor industry. His work focuses on developing innovative solutions that address critical challenges in wafer processing.
Collaborations
Throughout his career, Holger has collaborated with esteemed colleagues, including Axel Preusse and Markus Nopper. These partnerships have contributed to the advancement of technologies in the semiconductor field.
Conclusion
Holger Schührer is a prominent figure in the realm of semiconductor innovation, with a patent that significantly enhances wafer processing techniques. His contributions continue to impact the industry positively.