Company Filing History:
Years Active: 2016-2017
Title: Hoang Le: Innovator in Semiconductor Technology
Introduction
Hoang Le is a prominent inventor based in San Jose, California, known for his contributions to semiconductor technology. With a total of 2 patents, he has made significant advancements in the field, particularly in the development of narrow semiconductor trench structures.
Latest Patents
Hoang Le's latest patents focus on systems and methods for narrow semiconductor trench structures. In one embodiment, the method for forming a narrow trench involves creating a first layer of insulating material on a substrate and then forming a trench through this layer and into the substrate. A second insulating material is applied to the first layer and the exposed portions of the trench. This second insulating material is subsequently removed from the first layer and the bottom of the trench. The trench is then filled with an epitaxial material, and the first layer of insulating material is removed. Finally, a narrow trench is formed by eliminating the remaining portions of the second insulating material.
Career Highlights
Hoang Le is currently employed at Vishay Siliconix, where he continues to innovate and develop new technologies in the semiconductor industry. His work has been instrumental in enhancing the efficiency and performance of semiconductor devices.
Collaborations
Some of Hoang Le's notable coworkers include The-Tu Chau and Kuo-In Chen, who have collaborated with him on various projects within the semiconductor field.
Conclusion
Hoang Le's contributions to semiconductor technology, particularly through his innovative patents, highlight his role as a key figure in advancing this critical industry. His work continues to influence the development of more efficient semiconductor devices.