Yokkaichi, Japan

Hitoshi Kobayashi



Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2007-2008

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2 patents (USPTO):Explore Patents

Title: Hitoshi Kobayashi: Innovator in Silicon Dioxide Technology

Introduction

Hitoshi Kobayashi is a notable inventor based in Yokkaichi, Japan. He has made significant contributions to the field of silicon dioxide technology, holding 2 patents that showcase his innovative approach to materials science.

Latest Patents

Kobayashi's latest patents include a pyrogenically produced silicon dioxide powder and a low viscosity-increment fumed-silica slurry. The first patent describes a silicon dioxide powder in the form of aggregates of primary particles with a BET surface area of 300±25 m²/g. These aggregates have an average surface area of 4800 to 6000 nm, an average equivalent circle diameter (ECD) of 60 to 80 nm, and an average circumference of 580 to 750 nm. This product is created through a pyrogenic process involving silicon tetrachloride and a second silicon component, achieving an adiabatic flame temperature of 1390 to 1450°C. It is designed for use as a filler. The second patent focuses on a fumed-silica that can create a slurry with excellent wettability to polar liquids, outstanding dispersibility, and low viscosity even at high concentrations. The water content in this slurry is controlled to meet specific weight loss and dynamic wetting rate criteria.

Career Highlights

Throughout his career, Hitoshi Kobayashi has worked with prominent companies such as Nippon Aerosil Co., Ltd. and Degussa Aktiengesellschaft. His experience in these organizations has allowed him to refine his expertise in the production and application of silicon dioxide materials.

Collaborations

Kobayashi has collaborated with notable coworkers, including Masamichi Murota and Hirokuni Shirono. Their joint efforts have contributed to advancements in the field of materials science.

Conclusion

Hitoshi Kobayashi's innovative work in silicon dioxide technology has led to significant advancements in the industry. His patents reflect a deep understanding of materials science and a commitment to developing practical applications.

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